At the recent "SSLCHINA 2021: Mini/Micro LED Technology Industry Application Forum", Hu Jianzheng, Director of MOCVD Process Technology of China Micro Semiconductor Equipment (Shanghai) Co., Ltd., shared the Prismo UniMax® MOCVD equipment used for blue and green MiniLED production by China Micro Semiconductors (Shanghai) Co., Ltd. The latest developments.
Cyflwynodd Hu Jianzheng, o gymharu â LEDs traddodiadol a ddefnyddir ar gyfer goleuo, fod gan wafferi epitaxial Mini / Micro LED ofynion llymach ar gyfer unffurfiaeth tonfedd a rhif gronynnau. Mae angen datblygu llwyfan MOCVD newydd i wella unffurfiaeth tonfedd wafferi epitaxial a lleihau gronynnau. Nifer, er mwyn gwireddu cymhwysiad masnachol Mini / Micro LED.
The latest MOCVD platform Prismo UniMax® developed by China Microelectronics that can be used for the mass production of MiniLEDs, through the fine adjustment of local temperature field and optimization of the flow field, the blue{{0}}green LEDs grown on 4" and 6" substrates have achieved good results.的wavelength uniformity. Under the condition of 414" configuration, the uniformity of the wavelength within and between the blue LED chip is also very high, respectively, 0.71 nm and 0.87 nm (1σ); under the condition of 106" configuration, the wavelength of the blue LED chip is uniform The performance reaches 0.84 nm (1σ), and the maximum and minimum difference in wavelength of the 100mm100mm square plate is as low as 2.4nm. For the 6-inch green LED with an average wavelength of 530nm, the on-chip wavelength uniformity is 1.04nm (1σ), and the maximum and minimum difference in wavelength of the 100mm100mm square chip is only 4.6nm.
According to the official website of China Microelectronics, in terms of configuration, the Prismo UniMax® MOCVD equipment has up to 4 reaction chambers, which can process 108 4-inch or 40 6-inch high-performance gallium nitride-based blue-green MiniLED epitaxial wafers at the same time. The adjustment can be extended to process 164 4-inch or 72 6-inch epitaxial wafers at the same time, and its process capability can also be extended to grow 8-inch epitaxial wafers. In addition, the equipment is equipped with a 785mm large-diameter graphite tray, which greatly improves the equipment production capacity and effectively reduces the production cost of MiniLED epitaxial wafers.
It is reported that the Prismo UniMax® MOCVD equipment was officially released in June this year, and is mainly used for the mass production of GaN-based MiniLED epitaxial wafers. On December 9, China Microelectronics announced that the order for Prismo UniMax® MOCVD equipment has exceeded 100 cavities.
It is understood that China Micro Semiconductor Equipment Co., Ltd. was established in 2004 and is headquartered in Shanghai. In 2019, it was listed on the Science and Technology Innovation Board of the Shanghai Stock Exchange. It is mainly engaged in the research and development, production and sales of high-end semiconductor equipment and pan-semiconductor equipment. The company's product distribution There are: CCP etching equipment, ICP etching equipment, deep silicon etching equipment, MOCVD equipment, VOC purification equipment.
Among them, the Prismo series MOCVD equipment developed by China Microelectronics can be widely used in the production of various devices based on group III nitrides, including blue-green LEDs, deep ultraviolet LEDs and power devices. At present, China Micro's MOCVD equipment has been put into mass production on the major LED production lines in the industry.
In 2020, China Microelectronics achieved operating income of 2.273 billion yuan, a year-on-year increase of 16.76 percent ; net profit attributable to shareholders of listed companies was 492 million yuan, a year-on-year increase of 161.02 percent . In the first half of 2021, China Micro's operating income was 1.339 billion yuan, a year-on-year increase of 36.82 percent ; net profit attributable to shareholders of listed companies was 397 million yuan, a year-on-year increase of 233.17 percent .